Patent · US Active

Sub-resolution assist devices and methods

US9128383B2 · kind B2 · utility

0Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 9, 2014
Grant dateSep 8, 2015
Priority date—
Expiry dateMay 9, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70433
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive phase adjustment region interposed between the first optical attenuation region and the second optical attenuation region, the phase adjustment region being configured to change a phase of incident illumination radiation by altering an optical property of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.