Lithographic apparatus and device manufacturing method
US9134631B2 · kind B2 · utility
2Cited by
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20Claims
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Key dates
| Filing date | Mar 19, 2009 |
| Grant date | Sep 15, 2015 |
| Priority date | — |
| Expiry date | Nov 20, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70533
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic apparatus, a control system is provided to automatically reduce throughput in the event that lens-heating aberrations exceed a certain threshold. The determination of whether lens-heating aberrations will exceed the threshold may be based upon a prediction, e.g. using a lens-heating model, or on measurements taken from a previously exposed substrate. Reduction of throughput of the device manufacture may be effected by reducing beam power or the duty cycle of the apparatus. In a particular embodiment, the time taken for substrate movement between exposure portions is increased.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.