Method of investigating and correcting aberrations in a charged-particle lens system
US9136087B2 · kind B2 · utility
2Cited by
16References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 3, 2013 |
| Grant date | Sep 15, 2015 |
| Priority date | — |
| Expiry date | Sep 3, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1534
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system of investigating aberrations in a charged particle lens system, wherein a charged particle beam is directed from a multitude of directions through a pivot point on a sample stage. An image figure is recorded for each of multiple focus settings at each beam direction setting, creating a set of registered images. This set of images is compared to reference images to derive aberrations present in the lens system without the use of an amorphous sample present.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.