Patent · US Active

Polishing apparatus and wear detection method

US9144878B2 · kind B2 · utility

1Cited by
2References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2014
Grant dateSep 29, 2015
Priority date
Expiry dateMar 28, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67075
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

There is provided a polishing apparatus capable of detecting uneven wear occurring on a polishing pad and detecting an appropriate replacement timing of the polishing pad. The polishing apparatus detects, every predetermined time, a value of rotation speed or a value of rotation torque of a table drive shaft for rotationally driving a polishing table or a dresser drive shaft for driving a dresser, or a value of swing torque of a dresser swing shaft for driving the dresser; calculates a change quantity thereof based on the value of the detected rotation speed, the value of the detected rotation torque, or the value of the detected swing torque; determines whether or not the change quantity exceeds a predetermined value; and notifies a user of a warning when a determination is made that the change quantity exceeds the predetermined value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.