Method of making photomask layout and method of forming photomask including the photomask layout
US9147033B2 · kind B2 · utility
0Cited by
4References
14Claims
0Family size
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Key dates
| Filing date | Sep 11, 2013 |
| Grant date | Sep 29, 2015 |
| Priority date | — |
| Expiry date | Oct 25, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/38
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of making a photomask layout is provided. A graphic data of a photomask is provided. The graphic data includes at least one rectangular pattern. A correction step is performed to the graphic data by using a computer. The correction step includes adding a substantially ring-shaped pattern inside the rectangular pattern. A method of forming a photomask by using the photomask layout obtained by the said method is also provided. In an embodiment, the photomask is suitable for defining micro-lenses of a solid-state image sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.