Ching-Shu Lo
6Patents
1h-index
8Co-inventors
40Inventor score
Filing activity: Sep 29, 2009 → Feb 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8938697B1 | Method of performing optical proximity correction for preparing mask projected onto wafer by photolithography | Physics | 2 | Active |
| US9256120B2 | Method of performing optical proximity correction for preparing mask projected onto wafer by photolithography | Physics | 0 | Active |
| US8233142B2 | Monitoring method of exposure apparatus | Physics | 0 | Active |
| US9147033B2 | Method of making photomask layout and method of forming photomask including the photomask layout | Physics | 0 | Active |
| US12204247B2 | Lithography film stack and lithography method | Physics | 0 | Active |
| US12020932B2 | Photoresist coating method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.