Base reactive photoacid generators and photoresists comprising same
US9156785B2 · kind B2 · utility
6Cited by
23References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2011 |
| Grant date | Oct 13, 2015 |
| Priority date | — |
| Expiry date | Jan 25, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.