Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
US9159534B2 · kind B2 · utility
1Cited by
18References
20Claims
0Family size
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Key dates
| Filing date | Jan 20, 2014 |
| Grant date | Oct 13, 2015 |
| Priority date | — |
| Expiry date | Jan 20, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0827
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.