Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
US9169421B2 · kind B2 · utility
3Cited by
3References
12Claims
0Family size
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Key dates
| Filing date | Feb 20, 2014 |
| Grant date | Oct 27, 2015 |
| Priority date | — |
| Expiry date | Feb 20, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/442
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.