Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
US9176371B2 · kind B2 · utility
2Cited by
6References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2009 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Feb 24, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.