Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit
US9176375B2 · kind B2 · utility
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5References
20Claims
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Key dates
| Filing date | Feb 10, 2014 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Feb 10, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.