Liquid process apparatus and liquid process method
US9177838B2 · kind B2 · utility
0Cited by
0References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2012 |
| Grant date | Nov 3, 2015 |
| Priority date | — |
| Expiry date | Jun 15, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/423
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.