Patent · US Active

Photoresist compositions and methods of forming photolithographic patterns

US9188864B2 · kind B2 · utility

1Cited by

7References

10Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Young Cheol Bae · Weston, US
Deyan Wang · Hudson, US
Thomas Cardolaccia · Natick, US
Seokho KANG · Sturbridge, US
Rosemary Bell · Wayland, US

Key dates

Filing date	May 31, 2011
Grant date	Nov 17, 2015
Priority date	—
Expiry date	Oct 17, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F220/283
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.