Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
US9188869B2 · kind B2 · utility
1Cited by
2References
11Claims
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Key dates
| Filing date | Jul 29, 2014 |
| Grant date | Nov 17, 2015 |
| Priority date | — |
| Expiry date | Jul 29, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L33/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.