Plasma processing apparatus
US9196461B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 2, 2011 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Feb 26, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32568
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus includes: a lower electrode which is provided in a process chamber and functions as a holding stage on which a substrate is placed; an upper electrode which functions as the shower head for introducing a gas and is vertically movable; a cover body which is provided over the upper electrode and hermetically closes an upper opening of the process chamber; an isolated space providing member which is provided to close a space between the upper electrode and the cover body, provides therein an isolated space isolated from a space outside the isolated space providing member, and includes therein an inlet/outlet through which a gas is introduced/exhausted, wherein a size of the isolated space varies as the upper electrode is vertically moved; and a gas introducing and exhausting mechanism which introduces/exhausts a gas into/from the isolated space of the isolated space providing member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.