Patent · US Active

Showerhead insulator and etch chamber liner

US9196462B2 · kind B2 · utility

1Cited by
6References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 11, 2012
Grant dateNov 24, 2015
Priority date
Expiry dateMay 5, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32477
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The present invention generally comprises a showerhead insulator for electrically isolating a showerhead assembly from a processing chamber wall, a chamber liner assembly for lining a processing chamber, a lower chamber liner for lining an evacuation area of a processing chamber, and a flow equalizer for ensuring a uniform evacuation of a processing chamber. When processing a substrate within an etching chamber, the showerhead needs to be electrically isolated from ground. A showerhead insulator may insulate the showerhead from ground while also preventing plasma from entering the volume that it occupies. A chamber liner may protect the chamber walls from contamination and reduce chamber cleaning. A flow equalizer will permit processing gases to be evenly pulled into the evacuation channel rather than a disproportionate flow into the evacuation channel. A lower liner can aid in uniformly drawing the vacuum and protecting the chamber walls from contamination.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.