Patent · US Active

Method and apparatus for testing a semiconductor wafer

US9207276B2 · kind B2 · utility

1Cited by
4References
20Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 26, 2009
Grant dateDec 8, 2015
Priority date
Expiry dateFeb 17, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/2887
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for testing a semiconductor wafer comprises providing a semiconductor wafer. The semiconductor wafer comprises a protruding annular rim, a first redistribution structure disposed on the front side of the semiconductor wafer, a second redistribution structure disposed on the rear side of the semiconductor wafer within the protruding annular rim and a plurality of vias extending from the front side to the rear side. A first probe is contacted to the first redistribution structure on the front side and a second probe is contacted to the second redistribution structure on the rear side. The first probe is in contact with the first redistribution structure and the second probe is in contact with the second redistribution structure at the same time.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.