Patent · US Active

In2O3—SnO2—ZnO sputtering target

US9214519B2 · kind B2 · utility

1Cited by
2References
8Claims
0Family size

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Key dates

Filing dateMay 7, 2012
Grant dateDec 15, 2015
Priority date—
Expiry dateSep 20, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/02631
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A sputtering target including indium (In), tin (Sn) and zinc (Zn) and an oxide including one or more elements X selected from the following group X,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.