Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
US9223230B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2013 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Apr 24, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A loading method and apparatus loads an object via a carrier system in an exposure apparatus that exposes the object with an exposure beam via a projection optical system and a liquid. Position information of the depressed section is obtained by detecting a part of a stage that mounts the object in a depressed section placed at a part of an upper surface of the stage. The carrier system carries the object to above the stage placed at an exchange position of the object, the exchange position being distanced from the projection optical system. The object is loaded on the stage based on the position information of the depressed section so that the carried object is mounted in the depressed section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.