Periodic patterns and techniques to control misalignment between two layers
US9234745B2 · kind B2 · utility
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119References
12Claims
0Family size
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Key dates
| Filing date | Jul 1, 2015 |
| Grant date | Jan 12, 2016 |
| Priority date | — |
| Expiry date | Jul 1, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.