Coating compositions for use with an overcoated photoresist
US9244352B2 · kind B2 · utility
2Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2010 |
| Grant date | Jan 26, 2016 |
| Priority date | — |
| Expiry date | May 18, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0271
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.