Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
US9245740B2 · kind B2 · utility
10Cited by
1References
3Claims
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Key dates
| Filing date | Jun 4, 2014 |
| Grant date | Jan 26, 2016 |
| Priority date | — |
| Expiry date | Jun 4, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0228
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film having high purity and excellent physical and electrical properties by various deposition methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.