Two piece shutter disk assembly for a substrate process chamber
US9252002B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2012 |
| Grant date | Feb 2, 2016 |
| Priority date | — |
| Expiry date | Jan 20, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0068
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Shutter disk assemblies for use in process chambers to protect a substrate support disposed below the shutter disk assembly from undesired material deposition are provided herein. In some embodiments, a shutter disk assembly for use in a process chamber to protect a substrate support disposed below the shutter disk assembly may include an upper disk member having a top surface and a bottom surface; and a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the upper disk member to support the upper disk member and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the upper disk member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.