Patent · US Active

Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus

US9255892B2 · kind B2 · utility

3Cited by
3References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 13, 2015
Grant dateFeb 9, 2016
Priority date
Expiry dateAug 13, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24612
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.