Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US9268236B2 · kind B2 · utility
2Cited by
23References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2010 |
| Grant date | Feb 23, 2016 |
| Priority date | — |
| Expiry date | Feb 15, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.