Compositions and processes for photolithography
US9274427B2 · kind B2 · utility
2Cited by
2References
11Claims
0Family size
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Key dates
| Filing date | Jun 10, 2014 |
| Grant date | Mar 1, 2016 |
| Priority date | — |
| Expiry date | Jun 10, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L2205/03
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.