Position detection apparatus, imprint apparatus, and position detection method
US9283720B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2014 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Aug 12, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49769
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.