Inspection apparatus, lithographic apparatus, and device manufacturing method

US9285687B2 · kind B2 · utility

Assignee

• ASML Holding N.V. · NL

Inventors

• Stanislav Smirnov · Bethel, US
• Lev Ryzhikov · Norwalk, US
• Eric Brian Catey · Danbury, US
• Adel Joobeur · Milford, US
• David Heald · Brookfield, US
• Yevgeniy Konstantinovich Shmarev · Lagrangeville, US
• Richard David Jacobs · Brookfield, US

Key dates

• Filing date: Sep 10, 2012
• Grant date: Mar 15, 2016
• Expiry date: May 2, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70633
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.