Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
US9291905B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2015 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Feb 19, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01F35/2215
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A developing solution for photolithography in which tetrabutylammonium hydroxide (TBAH) is used as an alkaline agent of the developing solution and deposition of TBAH is suppressed. A method for producing a developing solution for photolithography capable of suppressing TBAH deposition when producing the developing solution by diluting a concentrated developing solution containing TBAH and a production apparatus used for the production method. The developing solution includes tetrabutylammonium hydroxide and at least one of a water-soluble organic solvent, a surfactant, and a clathrate compound. The temperature of the liquid is maintained at 27° C. or higher during dilution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.