Patent · US Active

Wafer stage with reciprocating wafer stage actuation control

US9298106B1 · kind B1 · utility

1Cited by
3References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 7, 2012
Grant dateMar 29, 2016
Priority date
Expiry dateNov 7, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A wafer stage system with reciprocating wafer stage actuation control may include a wafer stage, a motor configured to actuate the wafer stage in a first and/or second direction along an axis, a first reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the first direction, the first reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the first direction, the first reciprocating mechanism configured to accelerate the wafer stage in the second direction, and a second reciprocating mechanism configured to decelerate the wafer stage after the wafer stage is actuated to a desired position in the second direction, the second reciprocating mechanism configured to store energy captured while decelerating the wafer stage in the second direction, the second reciprocating mechanism further configured to accelerate the wafer stage in the first direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.