Patent · US Active

Illumination system for EUV microlithography

US9304400B2 · kind B2 · utility

0Cited by

5References

34Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Michael Layh · Altusried, DE
Ralf Stuetzle · Aalen, DE
Damian Fiolka · Oberkochen, DE
Martin Endres · Oberkochen, DE
Holger Weigand · Oberkochen, DE

Key dates

Filing date	Mar 2, 2011
Grant date	Apr 5, 2016
Priority date	—
Expiry date	Feb 25, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70075
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.