Patent · US Active

Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

US9310692B2 · kind B2 · utility

1Cited by

4References

35Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ralf Stuetzle · Aalen, DE
Martin Endres · Oberkochen, DE
Jens Ossmann · Aalen, DE
Michael Layh · Altusried, DE

Key dates

Filing date	Nov 1, 2010
Grant date	Apr 12, 2016
Priority date	—
Expiry date	Dec 16, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70558
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.