Patent · US Active

Sputtering apparatus

US9312108B2 · kind B2 · utility

1Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 28, 2014
Grant dateApr 12, 2016
Priority date
Expiry dateApr 28, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/34
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A magnetron assembly for a rotary target cathode comprises an elongated support structure, a magnet bar structure movably positioned below the support structure, and a plurality of drive modules coupled to the support structure. The drive modules each include a motorized actuation mechanism operatively coupled to the magnet bar structure. A controller and battery module is coupled to the support structure and is in operative communication with the drive modules. The controller and battery module includes an electronic controller and at least one rechargeable battery. The battery is configured to energize each motorized actuation mechanism and the electronic controller. One or more power generation modules is coupled to the support structure and in electrical communication with the battery, such that electrical energy output from the power generation modules recharges the battery.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.