Patent · US Active

Profile measuring instrument, adjusting method for profile measuring instrument, and profile measuring method

US9316476B2 · kind B2 · utility

1Cited by
3References
3Claims
0Family size

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Key dates

Filing dateOct 16, 2013
Grant dateApr 19, 2016
Priority date
Expiry dateMay 16, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B5/201
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A profile measuring instrument usable to perform a rotary scanning measurement and a linear scanning measurement on a workpiece in the form of a revolution solid, includes: a turntable on which the workpiece is mounted, the turntable being rotatable around a predetermined rotation axis; a rotary scanning measurement unit being adapted to measure a displacement of a surface of the workpiece mounted on the turntable; a linear scanning measurement unit being adapted to measure a profile of the surface of the workpiece mounted on the turntable along a predetermined measurement axis; and an aligning mechanism being adapted to relatively move the linear scanning measurement unit and the turntable in a direction intersecting with the measurement axis. The linear scanning measurement unit and the turntable are adjusted to relative positions at which the measurement axis passes through the rotation axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.