Lithographic apparatus and device manufacturing method
US9316919B2 · kind B2 · utility
4Cited by
30References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2014 |
| Grant date | Apr 19, 2016 |
| Priority date | — |
| Expiry date | Dec 29, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.