EPI base ring

US9322097B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Steve Aboagye · San Jose, US
• Paul Brillhart · Pleasanton, US
• Surajit Kumar · Sunnyvale, US
• Anzhong Chang · San Jose, US
• Satheesh Kuppurao · San Jose, US
• Mehmet Tugrul Samir · Mountain View, US
• David K. Carlson · San Jose, US

Key dates

• Filing date: Mar 18, 2013
• Grant date: Apr 26, 2016
• Expiry date: Oct 25, 2034

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/481
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial.