Surajit Kumar
14Patents
4h-index
39Co-inventors
56Inventor score
Filing activity: Sep 20, 2010 → Dec 13, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9322097B2 | EPI base ring | Chemistry; Metallurgy | 6 | Active |
| US9267742B2 | Apparatus for controlling the temperature uniformity of a substrate | Mechanical Engineering; Lighting; Heating | 4 | Active |
| US9768043B2 | Quartz upper and lower domes | Chemistry; Metallurgy | 4 | Active |
| US8629370B2 | Assembly for delivering RF power and DC voltage to a plasma processing chamber | Emerging Cross-Sectional Technologies | 4 | Active |
| US8822876B2 | Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity | Emerging Cross-Sectional Technologies | 3 | Active |
| US10132003B2 | Heating modulators to improve epi uniformity tuning | Electricity | 2 | Active |
| US11577358B2 | Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing | Performing Operations; Transporting | 1 | Active |
| US9248509B2 | Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity | Emerging Cross-Sectional Technologies | 1 | Active |
| US10119192B2 | EPI base ring | Chemistry; Metallurgy | 1 | Active |
| US11021790B2 | Liner for processing chamber | Chemistry; Metallurgy | 0 | Active |
| US11209398B2 | High quality factor embedded resonator wafers | Electricity | 0 | Active |
| US11919123B2 | Apparatus and method for CMP temperature control | Performing Operations; Transporting | 0 | Active |
| US10386126B2 | Apparatus for controlling temperature uniformity of a substrate | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US11769684B2 | Wafer heater with backside and integrated bevel purge | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.