Patent · US Active

Lithography pupil shaping optical system and method for generating off-axis illumination mode

US9323052B2 · kind B2 · utility

0Cited by

1References

2Claims

0Family size

Assignee

Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

Fang Zhang · Zhuhai, CN
Jing Zhu · Shanghai, CN
Huijie Huang · Shanghai, CN
Qiang Song · Longbeilingcun, CN
Baoxi Yang · Beijing, CN
Ming-Hung Chen · Beijing, CN
Aijun Zeng · Shanghai, CN
Lihua Huang · Tangxia, CN
Zhonghua Hu · Shanghai, CN
Yanfen Xiao · Shanghai, CN

Key dates

Filing date	Apr 28, 2013
Grant date	Apr 26, 2016
Priority date	—
Expiry date	Apr 28, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70108
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography pupil shaping optical system and method for generating off-axis illumination mode. The invention is composed of illumination mode generation unit, rotatable wave plate, polarization beam splitter unit, ring I generation unit and ring II generation unit. Through selecting corresponding diffractive optical element and appropriate adjustment, this invention can generate various illumination modes including single ring illumination mode and double ring illumination mode. The intensity at pupil plane and the inner and outer diameters of the off-axis illumination mode can be adjusted continuously.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.