Patent · US Active

Method for manufacturing liquid ejection head substrate

US9333749B2 · kind B2 · utility

3Cited by
4References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2012
Grant dateMay 10, 2016
Priority date
Expiry dateJul 6, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49401
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A method for manufacturing a liquid ejection head substrate, including: (1) a step for etching a substrate, which has an energy generating element at a side of a first surface, from a side of a second surface, which is a surface on the opposite side from the first surface, thereby to form at a time at least a part of a liquid supply port and a recess along a cutting section of the substrate; (2) a step for irradiating a laser beam toward the side of first surface from the etched surface of the recess so as to form a reformed portion inside the substrate; and (3) a step for cutting the substrate at the reformed portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.