Patent · US Active

Residual material detection in backdrilled stubs

US9341670B2 · kind B2 · utility

6Cited by
5References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 20, 2014
Grant dateMay 17, 2016
Priority date
Expiry dateDec 23, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T408/05
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A stub of a via formed in a printed circuit board is backdrilled to a predetermined depth. A capacitance probe is positioned within the via. Then the capacitance probe is used to obtain a test capacitance measurement. The test capacitance measurement is compared to a predetermined baseline capacitance measurement. Residual conductive plating material in the backdrilled stub causes the test capacitance measurement to exceed the predetermined baseline capacitance measurement. An indication is made that the predetermined baseline capacitance measurement has been exceeded.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.