Patent · US Active

Dual-direction chemical delivery system for ALD/CVD chambers

US9353440B2 · kind B2 · utility

351Cited by
13References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 20, 2013
Grant dateMay 31, 2016
Priority date
Expiry dateApr 29, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/4259
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.