Projection exposure apparatus with optimized adjustment possibility

US9354524B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Boris Bittner · Roth, DE
• Holger Walter · Aalen, DE
• Matthias Roesch · Aalen, DE

Key dates

• Filing date: Mar 22, 2012
• Grant date: May 31, 2016
• Expiry date: Mar 22, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.