Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
US9354528B2 · kind B2 · utility
4Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2012 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Jan 27, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70875
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.