Patent · US Active

Arrangement for use in a projection exposure tool for microlithography having a reflective optical element

US9354529B2 · kind B2 · utility

0Cited by

6References

12Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
ASML NETHERLANDS B.V. · NL

Inventors

Dirk Heinrich Ehm · Beckingen, DE
Maarten Van Kampen · Eindhoven, NL
Stefan Schmidt · Aalen, DE
Vadim Yevgenyevich Banine · Deurne, NL
Erik Roelof Loopstra · Geldrop, NL

Key dates

Filing date	Jul 30, 2012
Grant date	May 31, 2016
Priority date	—
Expiry date	Oct 20, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70958
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.