Maarten Van Kampen
9Patents
3h-index
25Co-inventors
53Inventor score
Filing activity: Mar 17, 2011 → Dec 28, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9482960B2 | Pellicle for reticle and multilayer mirror | Physics | 11 | Active |
| US9395630B2 | Lithographic apparatus and method | Physics | 10 | Active |
| US9989844B2 | Pellicle for reticle and multilayer mirror | Physics | 5 | Active |
| US9606445B2 | Lithographic apparatus and method of manufacturing a device | Physics | 3 | Active |
| US10481510B2 | Graphene spectral purity filter | Physics | 2 | Active |
| US10359710B2 | Radiation system and optical device | Electricity | 1 | Active |
| US9773578B2 | Radiation source-collector and method for manufacture | Physics | 1 | Active |
| US12055478B2 | Apparatus and method for cleaning an inspection system | Physics | 0 | Active |
| US9354529B2 | Arrangement for use in a projection exposure tool for microlithography having a reflective optical element | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.