Patent · US Active

Method and apparatus for design of a metrology target

US9355200B2 · kind B2 · utility

13Cited by

7References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Guangqing Chen · Fremont, US
Eric Kent · San Jose, US
Jen-Shiang Wang · Sunnyvale, US
Omer Abubaker Omer Adam · Veldhoven, NL

Key dates

Filing date	Dec 19, 2014
Grant date	May 31, 2016
Priority date	—
Expiry date	Dec 19, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG06F2119/18
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.