Substrate liquid processing apparatus for separating processing solution and atmosphere from each other within collection cup
US9355871B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2012 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Mar 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate liquid processing apparatus is provided, in which a processing solution and an atmosphere can be separated from each other within a collection cup. The substrate liquid processing apparatus includes: a substrate rotation unit; a processing solution supply unit; a collection cup configured to collect the processing solutions; liquid collection regions formed at the collection cup; a liquid drain opening formed at a bottom portion of the collection cup; an exhaust opening formed above the liquid drain opening; a fixed cover configured to cover an upper portion of the exhaust opening with a space therebetween; an elevating cup provided above the fixed cover and configured to guide the processing solutions into the liquid collection regions; and a cup elevating unit configured to move up and down the elevating cup depending on the kinds of the processing solutions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.