Methods and apparatus for synchronizing RF pulses in a plasma processing system
US9368329B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2012 |
| Grant date | Jun 14, 2016 |
| Priority date | — |
| Expiry date | Jul 17, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A synchronized pulsing arrangement for providing at least two synchronized pulsing RF signals to a plasma processing chamber of a plasma processing system is provided. The arrangement includes a first RF generator for providing a first RF signal. The first RF signal is provided to the plasma processing chamber to energize a plasma therein, the first RF signal representing a pulsing RF signal. The arrangement also includes a second RF generator for providing a second RF signal to the plasma processing chamber. The second RF generator has a sensor subsystem for detecting values of at least one parameter associated with the plasma processing chamber that reflects whether the first RF signal is pulsed high or pulsed low and a pulse controlling subsystem for pulsing the second RF signal responsive to the detecting the values of at least one parameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.