Polishing pad having micro-grooves on the pad surface
US9375822B2 · kind B2 · utility
12Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 4, 2014 |
| Grant date | Jun 28, 2016 |
| Priority date | — |
| Expiry date | Nov 4, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/26
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing pad is provided herein, which may include a plurality of soluble fibers having a diameter in the range of about 5 to 80 micrometers, and an insoluble component. The pad may also pad include a first surface having a plurality of micro-grooves, wherein the soluble fibers form the micro-grooves in the pad. The micro-grooves may have a width and/or depth up to about 150 micrometers. In addition, a method of forming the polishing pad and a method of polishing a surface with the polishing pad is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.