Inventor · Hudson, NH, US

David Adam Wells

14Patents

4h-index

7Co-inventors

45Inventor score

Filing activity: Jul 19, 2007 → Nov 4, 2014

Most-cited inventions

Patent	Title	Area	Cited by	Status
US9162341B2	Chemical-mechanical planarization pad including patterned structural domains	Performing Operations; Transporting	15	Active
US8684794B2	Chemical mechanical planarization pad with void network	Performing Operations; Transporting	15	Active
US8172648B2	Chemical-mechanical planarization pad	Performing Operations; Transporting	13	Active
US9375822B2	Polishing pad having micro-grooves on the pad surface	Performing Operations; Transporting	12	Active
US8137166B2	Polishing pad having micro-grooves on the pad surface	Performing Operations; Transporting	3	Active
US7985121B2	Chemical-mechanical planarization pad having end point detection window	Performing Operations; Transporting	2	Active
US8430721B2	Chemical-mechanical planarization pad	Performing Operations; Transporting	1	Active
US8491360B2	Three-dimensional network in CMP pad	Performing Operations; Transporting	1	Active
US8758659B2	Method of grooving a chemical-mechanical planarization pad	Performing Operations; Transporting	1	Active
US8900036B2	Polishing pad having micro-grooves on the pad surface	Performing Operations; Transporting	1	Active
US9796063B2	Multi-layered chemical-mechanical planarization pad	Performing Operations; Transporting	0	Active
US8435099B2	Chemical-mechanical planarization pad including patterned structural domains	Performing Operations; Transporting	0	Active
US8377351B2	Polishing pad with controlled void formation	Emerging Cross-Sectional Technologies	0	Active
US8790165B2	Multi-layered chemical-mechanical planarization pad	Performing Operations; Transporting	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.